Design for Manufacturability and Yield for Nano-Scale CMOS by Charles Chiang, Jamil Kawa

By Charles Chiang, Jamil Kawa

This e-book walks the reader via the entire facets of manufacturability and yield in a nano-CMOS strategy. It covers all CAD/CAE elements of a SOC layout stream and addresses a brand new subject (DFM/DFY) severe at ninety nm and past. This publication is a needs to learn booklet the intense training IC fashion designer and a very good primer for any graduate pupil motive on having a profession in IC layout or in EDA software improvement.

Show description

Read or Download Design for Manufacturability and Yield for Nano-Scale CMOS (Integrated Circuits and Systems) PDF

Best textbook books

Sociology (14th Edition)

Macionis empowers scholars to appreciate the area round them via a sociological lens, to allow them to higher comprehend sociology and their very own lives.
Sociology, 14th version is written to assist scholars locate and use sociology in daily life. With a whole theoretical framework and an international point of view, Sociology bargains scholars an obtainable and correct creation to sociology.

Leakage in Nanometer CMOS Technologies (Integrated Circuits and Systems)

Covers intimately promising strategies on the equipment, circuit, and structure degrees of abstraction after first explaining the sensitivity of a number of the MOS leakage resources to those stipulations from the 1st rules. additionally taken care of are the ensuing results so the reader knows the effectiveness of leakage strength relief ideas lower than those various stipulations.

VLSI Physical Design: From Graph Partitioning to Timing Closure

Layout and optimization of built-in circuits are necessary to the construction of latest semiconductor chips, and actual optimizations have gotten extra trendy because of semiconductor scaling. glossy chip layout has turn into so advanced that it really is principally played by means of really expert software program, that is often up-to-date to handle advances in semiconductor applied sciences and elevated challenge complexities.

Psychology in Action (10th Edition)

Within the tenth variation of Psychology in motion, writer Karen Huffman redefines and refocuses her message of "active learning". this can be mirrored as "Student Engagement via lively Participation". All in-text pedagogy (including the recent MythBuster field) are subsumed below this great class making it more straightforward for reps to concretely display this subject matter.

Extra info for Design for Manufacturability and Yield for Nano-Scale CMOS (Integrated Circuits and Systems)

Example text

10 shows the typical life cycle of a new product. The typical time needed for a product from concept to first silicon is product dependent but is estimated on an average to be two years with a total cost anywhere from $25 Million to $40 Million. A typical re-spin is 6 months. Now, the cost of a re-spin is interesting to figure out. From a materials and engineering time perspective it is no more than perhaps $2 millions. 6. 10. Revenue as a Function of Design Cycle half the total revenue of the product.

4 demonstrates the need for OPC in sub-wavelength lithography. Examples of layout procedures are optical proximity correction (OPC), which could be rule or model based, and which involves the addition of sub-resolution assist features (SRAF). An example of a combination of a layout-mask procedure would be phase-shift mask (PSM). Examples of optical procedures of RET includes off-axis illumination, pupil filtering, and multiple exposures. Since we will be covering these in detail in Chapter 3 we will limit our exposure of this topic to the basics.

4 shows the wavelength of the light source used versus the technology node processed using that source light. We obviously skipped many technology nodes but the point we wanted to stress here is that past the 130nm technology node the critical dimension (CD) of the featured technology is significantly less than half of the wavelength (λ) of the light source used in the lithography. It is also significant to mention that efforts to develop a 157 nm illumination source has been all but abandoned in 2005 due to vast technical difficulties associated with the mask and photoresist technologies needed to go along with that light source.

Download PDF sample

Rated 4.91 of 5 – based on 44 votes